{"id":185,"date":"2015-06-01T14:06:07","date_gmt":"2015-06-01T12:06:07","guid":{"rendered":"http:\/\/www.icmm.csic.es\/forcetool\/?page_id=185"},"modified":"2015-06-01T14:06:07","modified_gmt":"2015-06-01T12:06:07","slug":"applications-of-oxidation-scanning-probe-lithographyi","status":"publish","type":"page","link":"https:\/\/wp.icmm.csic.es\/forcetool\/research-activities\/nanofabrication-and-nanolithography\/applications-of-oxidation-scanning-probe-lithographyi\/","title":{"rendered":"Applications of oxidation Scanning Probe Lithography (I)"},"content":{"rendered":"<p><strong>1. Template growth <\/strong><\/p>\n<div align=\"justify\">The nanoscale silicon dioxide structures fabricated by oxidation scanning probe lithography (o-SPL) can be used as templates to form ordered molecular structures of variable size ranging from nanometers up to micrometers. The template growth of organic and biological molecules is achieved by physical, chemical or a combination of both methods. The electrostatic interactions between the nanostructures and the molecules can be tuned during the nanofabrication process. By this way, the interaction can be modulated to achieve the desired selectivity. Additionally we explore different chemical approaches for the functionalization of the nanostructures and the molecules of interest.<\/div>\n<div align=\"justify\">\n<div id=\"attachment_214\" style=\"width: 208px\" class=\"wp-caption alignnone\"><a href=\"https:\/\/wp.icmm.csic.es\/forcetool\/wp-content\/uploads\/sites\/32\/2015\/06\/Appl-1.jpg\"><img loading=\"lazy\" decoding=\"async\" aria-describedby=\"caption-attachment-214\" class=\"wp-image-214 size-full\" src=\"https:\/\/wp.icmm.csic.es\/forcetool\/wp-content\/uploads\/sites\/32\/2015\/06\/Appl-1.jpg\" alt=\"Appl (1)\" width=\"198\" height=\"190\" \/><\/a><p id=\"caption-attachment-214\" class=\"wp-caption-text\">Fig.1. Nanoscale deposition of protein-carriers on top of local oxides<\/p><\/div>\n<div id=\"attachment_213\" style=\"width: 357px\" class=\"wp-caption alignnone\"><a href=\"https:\/\/wp.icmm.csic.es\/forcetool\/wp-content\/uploads\/sites\/32\/2015\/06\/App-2.jpg\"><img loading=\"lazy\" decoding=\"async\" aria-describedby=\"caption-attachment-213\" class=\"wp-image-213 size-full\" src=\"https:\/\/wp.icmm.csic.es\/forcetool\/wp-content\/uploads\/sites\/32\/2015\/06\/App-2.jpg\" alt=\"App 2\" width=\"347\" height=\"158\" srcset=\"https:\/\/wp.icmm.csic.es\/forcetool\/wp-content\/uploads\/sites\/32\/2015\/06\/App-2.jpg 347w, https:\/\/wp.icmm.csic.es\/forcetool\/wp-content\/uploads\/sites\/32\/2015\/06\/App-2-300x137.jpg 300w, https:\/\/wp.icmm.csic.es\/forcetool\/wp-content\/uploads\/sites\/32\/2015\/06\/App-2-980x450.jpg 980w\" sizes=\"auto, (max-width: 347px) 100vw, 347px\" \/><\/a><p id=\"caption-attachment-213\" class=\"wp-caption-text\">Fig 2. Template growth of biological molecules<\/p><\/div>\n<p><strong>2. Etching masks <\/strong><\/p>\n<p align=\"justify\">The small silicon dioxide structures fabricated by o-SPL can also be used as etching hard masks to produce SiNWs after pattern transfer by reactive ion etching.<\/p>\n<div id=\"attachment_216\" style=\"width: 285px\" class=\"wp-caption alignnone\"><a href=\"https:\/\/wp.icmm.csic.es\/forcetool\/wp-content\/uploads\/sites\/32\/2015\/06\/Etching-Masks-1.jpg\"><img loading=\"lazy\" decoding=\"async\" aria-describedby=\"caption-attachment-216\" class=\"wp-image-216 size-medium\" src=\"https:\/\/wp.icmm.csic.es\/forcetool\/wp-content\/uploads\/sites\/32\/2015\/06\/Etching-Masks-1-275x300.jpg\" alt=\"Etching Masks 1\" width=\"275\" height=\"300\" srcset=\"https:\/\/wp.icmm.csic.es\/forcetool\/wp-content\/uploads\/sites\/32\/2015\/06\/Etching-Masks-1-275x300.jpg 275w, https:\/\/wp.icmm.csic.es\/forcetool\/wp-content\/uploads\/sites\/32\/2015\/06\/Etching-Masks-1.jpg 638w\" sizes=\"auto, (max-width: 275px) 100vw, 275px\" \/><\/a><p id=\"caption-attachment-216\" class=\"wp-caption-text\">Fig 3. Silicon oxide mask for pattern transfer (upper row) and the produced silicon nanowires (lower row) after dry etching<\/p><\/div>\n<p><strong>Relevant publications:<\/strong><\/p>\n<ul>\n<li>Y. K. Ryu, P. A. Postigo, F. Garcia, and R. Garcia, Applied Physics Letters, <strong>104<\/strong>, 223112 (2014)<\/li>\n<li>Ricardo Garc\u00eda, Marta Tello, Jean Francois Moulin and Fabio Biscarini,<br \/>\nNano Letters\u00a0 <strong>4<\/strong>, 1115 (2004)<\/li>\n<li>R.V.Mart\u00ednez, J. Mart\u00ednez, M. Chiesa, R. Garcia, E. Coronado, E. Pinilla-Cienfuegos and S. Tatay, Adv. Mater <strong>22<\/strong>, 588 (2010)<\/li>\n<\/ul>\n<\/div>\n","protected":false},"excerpt":{"rendered":"<p>1. Template growth The nanoscale silicon dioxide structures fabricated by oxidation scanning probe lithography (o-SPL) can be used as templates to form ordered molecular structures of variable size ranging from nanometers up to micrometers.&#46;&#46;&#46;<\/p>\n","protected":false},"author":58,"featured_media":0,"parent":179,"menu_order":2,"comment_status":"closed","ping_status":"open","template":"","meta":{"ngg_post_thumbnail":0,"footnotes":""},"class_list":["post-185","page","type-page","status-publish","hentry"],"_links":{"self":[{"href":"https:\/\/wp.icmm.csic.es\/forcetool\/wp-json\/wp\/v2\/pages\/185","targetHints":{"allow":["GET"]}}],"collection":[{"href":"https:\/\/wp.icmm.csic.es\/forcetool\/wp-json\/wp\/v2\/pages"}],"about":[{"href":"https:\/\/wp.icmm.csic.es\/forcetool\/wp-json\/wp\/v2\/types\/page"}],"author":[{"embeddable":true,"href":"https:\/\/wp.icmm.csic.es\/forcetool\/wp-json\/wp\/v2\/users\/58"}],"replies":[{"embeddable":true,"href":"https:\/\/wp.icmm.csic.es\/forcetool\/wp-json\/wp\/v2\/comments?post=185"}],"version-history":[{"count":0,"href":"https:\/\/wp.icmm.csic.es\/forcetool\/wp-json\/wp\/v2\/pages\/185\/revisions"}],"up":[{"embeddable":true,"href":"https:\/\/wp.icmm.csic.es\/forcetool\/wp-json\/wp\/v2\/pages\/179"}],"wp:attachment":[{"href":"https:\/\/wp.icmm.csic.es\/forcetool\/wp-json\/wp\/v2\/media?parent=185"}],"curies":[{"name":"wp","href":"https:\/\/api.w.org\/{rel}","templated":true}]}}