{"id":189,"date":"2015-06-01T14:07:42","date_gmt":"2015-06-01T12:07:42","guid":{"rendered":"http:\/\/www.icmm.csic.es\/forcetool\/?page_id=189"},"modified":"2015-06-01T14:07:42","modified_gmt":"2015-06-01T12:07:42","slug":"parallel-nanolithography","status":"publish","type":"page","link":"https:\/\/wp.icmm.csic.es\/forcetool\/research-activities\/nanofabrication-and-nanolithography\/parallel-nanolithography\/","title":{"rendered":"Parallel Nanolithography"},"content":{"rendered":"<p>We also pursue the parallelization of the scanning probe lithography by up scaling the physical processes, such as local oxidation. The process requires the use of a solid support (stamp) with multiple protrusions as the cathode electrode.<\/p>\n<p><a href=\"https:\/\/wp.icmm.csic.es\/forcetool\/wp-content\/uploads\/sites\/32\/2015\/06\/afm-topography.jpg\"><img loading=\"lazy\" decoding=\"async\" class=\"alignnone size-large wp-image-232\" src=\"https:\/\/wp.icmm.csic.es\/forcetool\/wp-content\/uploads\/sites\/32\/2015\/06\/PAR.-1.jpg\" alt=\"PAR. 1\" width=\"294\" height=\"197\" \/><img loading=\"lazy\" decoding=\"async\" class=\"alignnone size-large wp-image-231\" src=\"https:\/\/wp.icmm.csic.es\/forcetool\/wp-content\/uploads\/sites\/32\/2015\/06\/PAR.2.jpg\" alt=\"PAR.2\" width=\"385\" height=\"130\" srcset=\"https:\/\/wp.icmm.csic.es\/forcetool\/wp-content\/uploads\/sites\/32\/2015\/06\/PAR.2.jpg 385w, https:\/\/wp.icmm.csic.es\/forcetool\/wp-content\/uploads\/sites\/32\/2015\/06\/PAR.2-300x101.jpg 300w\" sizes=\"auto, (max-width: 385px) 100vw, 385px\" \/><\/a><\/p>\n<p><a href=\"https:\/\/wp.icmm.csic.es\/forcetool\/wp-content\/uploads\/sites\/32\/2015\/06\/PAR.4.jpg\"><img loading=\"lazy\" decoding=\"async\" class=\"alignnone size-large wp-image-229\" src=\"https:\/\/wp.icmm.csic.es\/forcetool\/wp-content\/uploads\/sites\/32\/2015\/06\/PAR.4.jpg\" alt=\"PAR.4\" width=\"351\" height=\"169\" srcset=\"https:\/\/wp.icmm.csic.es\/forcetool\/wp-content\/uploads\/sites\/32\/2015\/06\/PAR.4.jpg 351w, https:\/\/wp.icmm.csic.es\/forcetool\/wp-content\/uploads\/sites\/32\/2015\/06\/PAR.4-300x144.jpg 300w\" sizes=\"auto, (max-width: 351px) 100vw, 351px\" \/><\/a> <a href=\"https:\/\/wp.icmm.csic.es\/forcetool\/wp-content\/uploads\/sites\/32\/2015\/06\/PAR.3.jpg\"><img loading=\"lazy\" decoding=\"async\" class=\"alignnone size-large wp-image-230\" src=\"https:\/\/wp.icmm.csic.es\/forcetool\/wp-content\/uploads\/sites\/32\/2015\/06\/PAR.3.jpg\" alt=\"PAR.3\" width=\"259\" height=\"145\" \/><\/a><\/p>\n<div id=\"attachment_228\" style=\"width: 384px\" class=\"wp-caption alignnone\"><img loading=\"lazy\" decoding=\"async\" aria-describedby=\"caption-attachment-228\" class=\"wp-image-228 size-full\" src=\"https:\/\/wp.icmm.csic.es\/forcetool\/wp-content\/uploads\/sites\/32\/2015\/06\/afm-topography.jpg\" alt=\"afm topography\" width=\"374\" height=\"277\" srcset=\"https:\/\/wp.icmm.csic.es\/forcetool\/wp-content\/uploads\/sites\/32\/2015\/06\/afm-topography.jpg 374w, https:\/\/wp.icmm.csic.es\/forcetool\/wp-content\/uploads\/sites\/32\/2015\/06\/afm-topography-300x222.jpg 300w\" sizes=\"auto, (max-width: 374px) 100vw, 374px\" \/><p id=\"caption-attachment-228\" class=\"wp-caption-text\">Fig.1 AFM topography images of SiO2 pattern on silicon surface made by Local Oxidation Nanolithography<\/p><\/div>\n<p>&nbsp;<\/p>\n<div id=\"attachment_289\" style=\"width: 174px\" class=\"wp-caption alignnone\"><a href=\"https:\/\/wp.icmm.csic.es\/forcetool\/wp-content\/uploads\/sites\/32\/2015\/06\/afm-topography.-2jpg.jpg\"><img loading=\"lazy\" decoding=\"async\" aria-describedby=\"caption-attachment-289\" class=\"wp-image-289 size-full\" src=\"https:\/\/wp.icmm.csic.es\/forcetool\/wp-content\/uploads\/sites\/32\/2015\/06\/afm-topography.-2jpg.jpg\" alt=\"afm topography. 2jpg\" width=\"164\" height=\"333\" srcset=\"https:\/\/wp.icmm.csic.es\/forcetool\/wp-content\/uploads\/sites\/32\/2015\/06\/afm-topography.-2jpg.jpg 164w, https:\/\/wp.icmm.csic.es\/forcetool\/wp-content\/uploads\/sites\/32\/2015\/06\/afm-topography.-2jpg-148x300.jpg 148w\" sizes=\"auto, (max-width: 164px) 100vw, 164px\" \/><\/a><p id=\"caption-attachment-289\" class=\"wp-caption-text\">Fig.2. AFM topography images of pattern fabricated on silicon surface using Local Oxidation Nanolithography in octane atmosphere<\/p><\/div>\n","protected":false},"excerpt":{"rendered":"<p>We also pursue the parallelization of the scanning probe lithography by up scaling the physical processes, such as local oxidation. The process requires the use of a solid support (stamp) with multiple protrusions as&#46;&#46;&#46;<\/p>\n","protected":false},"author":58,"featured_media":0,"parent":179,"menu_order":4,"comment_status":"closed","ping_status":"open","template":"","meta":{"ngg_post_thumbnail":0,"footnotes":""},"class_list":["post-189","page","type-page","status-publish","hentry"],"_links":{"self":[{"href":"https:\/\/wp.icmm.csic.es\/forcetool\/wp-json\/wp\/v2\/pages\/189","targetHints":{"allow":["GET"]}}],"collection":[{"href":"https:\/\/wp.icmm.csic.es\/forcetool\/wp-json\/wp\/v2\/pages"}],"about":[{"href":"https:\/\/wp.icmm.csic.es\/forcetool\/wp-json\/wp\/v2\/types\/page"}],"author":[{"embeddable":true,"href":"https:\/\/wp.icmm.csic.es\/forcetool\/wp-json\/wp\/v2\/users\/58"}],"replies":[{"embeddable":true,"href":"https:\/\/wp.icmm.csic.es\/forcetool\/wp-json\/wp\/v2\/comments?post=189"}],"version-history":[{"count":0,"href":"https:\/\/wp.icmm.csic.es\/forcetool\/wp-json\/wp\/v2\/pages\/189\/revisions"}],"up":[{"embeddable":true,"href":"https:\/\/wp.icmm.csic.es\/forcetool\/wp-json\/wp\/v2\/pages\/179"}],"wp:attachment":[{"href":"https:\/\/wp.icmm.csic.es\/forcetool\/wp-json\/wp\/v2\/media?parent=189"}],"curies":[{"name":"wp","href":"https:\/\/api.w.org\/{rel}","templated":true}]}}