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Welcome to the sputtering lab website of our group. Here a complete and versatile set of equipment for fabrication of thin films and nanostructured materials by physical vapor deposition techniques is available to develop a large variety of research topics on nanoscience and materials science.
Labs: 001, 039 and 123
Contact: cprieto at icmm.csic.es
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People
Prof. Carlos Prieto (head)
Dr. Félix Jiménez-Villacorta
Leo Álvarez- Fraga
Adrián Rodríguez Palomo
External users / Collaborators
Prof. Rafael Ramírez (U. Carlos III)
Dr. Jorge Sánchez-Marcos (U. Autónoma Madrid)
Preparation techniques
– DC- and RF- magnetron sputtering.
– Co-sputtering and sequential sputtering deposition.
– Gas phase aggregation technique for nanoparticle deposition.
– Low and high substrate temperature deposition.
– Electron beam physical physical deposition.
– Low-pressure chemical vapor deposition.
Research topics
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– Graphene-based and oxide transparent conductive materials (TCM).
– Selective coatings for thermo-solar receivers. – Nanostructured magnetic materials. – Thermoelectric thin films. – Complex oxide thin films with multifunctional properties. For a list of recent papers, please click here. |
Projects
– «Generación de electricidad mediante materiales termoeléctricos y recubrimientos selectivos solares, ¿pueden ser eficientes estos dispositivos?». (EXPLORA, MAT2014-61582-EXP). I. Ciencia de Materiales de Madrid, (2015-2017). PI: C. Prieto
– “New solar collector concept for high temperature operation in CSP applications” (HITECO), SP1-Cooperation Collaborative project FP7-ENERGY-2010-1 (European Commission, Grant Agreement No. 256830). PI: C. Prieto
– “Graphene-based hybrid materials for optoelectronic properties” (MAT2012-37276) I. Ciencia de Materiales de Madrid (CSIC) (2013-2015). PI: A. de Andrés.
Equipment
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– Vacuum chamber (Pfeiffer – PLS500) equipped with 3 magnetron sputtering sources and 4-boat electron-beam evaporator (6.08 kW), for sequential sputtering, co-sputtering and sputtering deposition at high substrate temperatures.
– DC- and RF- power sources for magnetron sputtering. – High-vacuum flow-controlled furnace. – Oven for target sintering and standard heat treatment. |
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– Cluster magnetron source for deposition of nanoparticles on substrate with controlled conditions; equipped with additional magnetron for sequential sputtering for fabrication of nanoparticle/film systems. |
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– Home-made magnetron sputtering system for deposition/coating on pieces and substrates with non-standard geometry. |
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– Low-pressure chemical vapor deposition + Magnetron sputtering chamber for fabrication of graphene-based hybrid materials. |
Previously, in the sputtering lab
Xavier Díez-Betriú
Eduardo Salas-Colera
Rocío Martínez-Morillas
Ana Espinosa
Eva Céspedes
Jorge Sánchez-Marcos
Mª Ángeles Laguna-Marco
Isabel Muñoz-Ochando
Mercedes Vila
Ángel Muñoz-Martín
Susana Taboada
Antonio Bernabé
Ramón Castañer
Phone: +34 91 349 000 (Ext. 001 y 039)