New patent of the group

Method for nanostructured materials fabrication combining soft lithographic imprint, aluminum anodization and metal sputtering”

M. Vazquez, D. G. Trabada and D. Navas

EU Patent application PCT/EP2020/066600

The present invention relates to a method for nanostructured materials fabrication combining soft lithographic imprint, aluminum anodization and metal sputtering which permits the preparation of highly ordered nanoporous alumina templates with straight lines, square lattice ordering, and others.

The procedure is based on large-scale nanoimprint using patterned commercial disks as imprint media, followed by single anodization process and metal sputtering.

This technique constitutes a non-expensive method for mould production and pattern generation avoiding standard lithographical techniques useful in technologies such as for nano-photonic and magnonic devices.

This European Patent has been filed by CSIC in collaboration with Porto University