Archivo de la categoría: ion irradiation

Lattice damage in 9-MeV-carbon irradiated diamond and its recovery after annealing

Publicada el 31 julio, 2017 por icmmadmin

F. Agulló-Rueda, N. Gordillo, M. D. Ynsa, A. Maira, J. Cañas, and M. A. Ramos, “Lattice damage in 9-MeV-carbon irradiated diamond and its recovery after annealing,” Carbon , accepted (2017). We have studied the radiation damage in diamond as a … Sigue leyendo →

Publicado en diamond, ion irradiation, microscopy, nanocharacterization, photoluminescence, Publications, Raman spectroscopy | Etiquetado , , , , , , | Comentarios desactivados en Lattice damage in 9-MeV-carbon irradiated diamond and its recovery after annealing

Micro-Raman spectroscopy of near-surface damage in diamond irradiated with 9-MeV boron ions

Publicada el 16 enero, 2017 por icmmadmin

F. Agulló-Rueda, M. D. Ynsa, N. Gordillo, A. Maira, D. Moreno-Cerrada, and M. A. Ramos, “Micro-Raman spectroscopy of near-surface damage in diamond irradiated with 9-MeV boron ions,” Diamond Relat. Mater. 72, 94–98 (2017) We have studied the near-surface damage in … Sigue leyendo →

Publicado en diamond, ion irradiation, microscopy, nanocharacterization, photoluminescence, Raman spectroscopy | Etiquetado , , , , | Comentarios desactivados en Micro-Raman spectroscopy of near-surface damage in diamond irradiated with 9-MeV boron ions

Study of the formation mechanism of hierarchical silicon structures produced by sequential ion beam irradiation and anodic etching

Publicada el 23 diciembre, 2016 por icmmadmin

In a collaboration with the Autonomous University of Madrid (Department of Applied Physics and the Center for Micro Analysis of Materials) and the Institut für Solarenergieforschung Hameln (ISFH) of Germany we have studied the formation of micropatterns combining nanostructured (porous) … Sigue leyendo →

Publicado en HRTEM, ion irradiation, microscopy, nanocharacterization, nanoscience, nanotechnology, Raman spectroscopy, silicon | Etiquetado , , , , , , | Comentarios desactivados en Study of the formation mechanism of hierarchical silicon structures produced by sequential ion beam irradiation and anodic etching